空心微球表面电沉积金铜工艺及机理研究-分析化学专业毕业论文.docxVIP

摘要基于国内当前ICF聚变靶丸制备的需要，探讨研究新的靶丸制备 摘要 基于国内当前ICF聚变靶丸制备的需要，探讨研究新的靶丸制备 方法，以满足类型日益多样化、复杂化的靶丸制备需求，具有很强的 现实意义。通常的球形激光聚变靶丸制备所用的方法有物理气相沉积 法(PVD)、化学气相沉积法(CVD)、化学沉积法、电化学沉积法等， 本文简单论述了各种方法的优缺点，从中看出电化学方法是相对而言 能够比较好的满足当前ICF聚变靶丸制备的需要的一种方法。 根据微球表面电沉积金属涂层的原理，设计并制作了一套适合于 空心微球表面电沉积金属的装置，利用该微球电沉积装置，结合实验 室中已有的常规镀金与镀铜工艺，建立了微球表面电沉积金、铜工艺。 该工艺可望在ICF制靶工作中得到推广和应用。 结合微球表面电沉积的原理与装置，初步建立了一个微球表面电 沉积金属的数学模型，通过对该模型的解得出了在微球表面电沉积过 程中达到稳态平衡状态时的法拉第极限电流公式，利用该公式可以定 性的解释一些实验中遇到的问题。 关键词：空心微球；电沉积；金；铜；极限电流 AbstractBased Abstract Based on the current domestic needs of the ICF fusion target preparation，study of new methods of target preparation has a strong practical significance in order to meet the increasingly diverse types and complex needs of target preparation．The usual sphericallaser fusion target preparation methods used in physical vapor deposition(PVD)，chemical vapor deposition(CVD)，chemical deposition，electrochemical deposition， etc．This paper briefly discusses the advantages and disadvantages of each method．from which electrochemical deposition iS a method of ICF fusion target preparation relative to see to meet the current needs better． According to the principle of mental electro．deposition on hol low microsphere surface．a device for electro．deposition of metal on hollow microsphere surface iS designed and produced．Using of the microspheres electro．deposition device．combined with laboratory routine gold and copper electro-deposition process，the electro-deposition technology of gold and copper on the microsphere surface fire established．The process iS expected to be promoted and applied in ICF target fabrication． Combined with microsphere electro．deposition principle and device， the initial mathematical model of metal electro．deposition on microsphere surface is established．the Faraday limiting current formula during electro．deposition to achieve steady state equilibrium on the microsphere surface iS obtained through the solution of the model．The formula can be used to explain qualitatively s