脉冲磁控溅射制备MgZrO复合介质膜的结构与性能-材料学专业毕业论文.docxVIP

ABSTRACTTitle：THE ABSTRACT Title：THE MICROSTRUCTURE AND PROPERTIES OF MgZrO CoMPOSITE PROTECTIVE LAYER DEPOSITED BY PULSED MAGNETRON SPUTTERING Major：Materials Science 膨 Name：He Mei rong Signature： Superadvisor：Zhao Kang Signature：坐兰z Abstract Alternatin2 Current Plasma Display Panel(AC PDP)iS a kind of flat panel display which emits light by gas discharge．But AC PDP has defects such as light emission inefficiency,high price and power consumption．So it is necessary to make improvements in structure，matedal， and manufacture method．The protective layer contacts directly with the discharge gas filled in AC PD P．Its matedals．microstructure and performance not only determine the life—time of the devices．but alSO act as one ofthe crucial factors for AC PDP in the reduction ofcost and power consumption．Up to now there is no suitable material that acting as protective layer in AC PDP iS better than commonly used MgO films．So it iS the main way to improvement MgO protective layer through adding other oxides．It has been proven that the protective layer deposited by pulsed magnetron sputtering has good properties．So the microstructure and properties ofcomposite MgO film deposited by pulsed magnetron sputtering were studied． ne pulsed magnetron sputtering method was used to deposit MgZxO composite protective layer．．Ik effect of Zr doping content，substrate bias，and unbalance magnetron sputtering on the microstructure and properties of composite films were studied．It Was found that Zr content， substrate bias，and unbalalice magnetron sputtering have obviously effects Oil microstructure， surface morphologies．residual stress and transmission coefficient of MgZrO film．When Zr content ofthe film iS about 2．03at．％and the films were deposited under一150V substrate bias． the film has strongest(200)preferred orientation，smallest grain size，lowest roughness。value． At the same time there were less porous in the films．It alSO Was fo