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流动注射在线置换共沉淀吸附预富集与火焰原子吸收光谱联用分析地质样品中痕量银-分析化学专业论文.docxVIP

流动注射在线置换共沉淀吸附预富集与火焰原子吸收光谱联用分析地质样品中痕量银-分析化学专业论文.docx

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中国地质科学院硕士学位论文Abstract 中国地质科学院硕士学位论文 Abstract it IS difficult to detect trace amount sliver of geological materials for its complicated matrices and co-existing ions’interference and limit of sensitivey of FAAS.This dissertation aimed at flow injection on—line Displacement/Coprecipitation sorption preconcentration Coupled with Atomic Absorption Spectrometry for Trace Amount of Sliver Analysis In Geological materials.It consists of the following five chapters. 1n the preface,the state of art of FI on-line preconcentration and separation based on the sorptinn of hydrophodic organo-metatlic complexes OU the wall of the KR coupled with FAAS, ETAAS,inductively coupled plasma atomic emission spectrometry(ICP-AES)and indIlctivelv coupled plasma mag spectrometry(ICP-MS)for trace element(speciationl analysis ale described. The advantages and shortcomings of these techniques are discussed. Coprecipitaffon is one of important preconcentration methods,but the p加cess of typical precipitation separation is complicated and time consuming.Nevertheless the口mbl啪is solved tlrmugh H onqine no-fi/ter coprecipitsfion technology.The second chaper generaI泌t11e application of eoprecipitation Sorpfion pmconcentration coupled with FAAS. The dismbuting and existing state of sliver in eanh is introduced in the third chaoter Funhunuore the sliver’phyicaI and chemical quality is deScfibed A novcl 171 onqine displacement sorption technique coupled with FAAS h褐been developed fo。selec曲e preconcentration and separation of trace metals in Complicated matric峨wbicb in砌ved on‘llne formation of the DDTC-Cu complex and its presorption叩to tlle曲er删ls of ‘b。KR,mtenfion of the analyte AgO)onto the inner walls of the KR through a di刚a∞嗽nt Teactionb咖een the Ag and the sorbed DDTC-Cu.The developed system was successfIlllv appI湖co interference_free determination of trace sliver in a variety of gc01晒cal maIerims with bigh contents of coexisting heavy metals without need for any masking reagenL In the fifth chapter,T

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