低气压等离子体制备及处理二氧化钛薄膜的前研究-等离子体物理专业毕业论文.docxVIP

低气压等离子体制各及处理二氧化钛薄膜的研究Study 低气压等离子体制各及处理二氧化钛薄膜的研究 Study on Ti02 films prepared and treated by plasma at low pressure Abstract Ti02 tllin film is widely applied to air and water purification，self-cleaning and solar cells． There are many methods to prepare Ti02 thin films such as sol—gel method，physical vapor deposition and chemical vapor deposition method and SO 011．In this paper,room temperature， low-pressure plasma Was applied to prepare Ti02 photocatalytic thin film on a glass substrate， besides the prepared films were treated by plasma．nle experimental results are as follows： 1．This paper has studied on discharge process by the electrical measurement and emission spectrum diagnosis．Discharge power along with the change of discharge parameters at AL A什02，TTIP+A忖02．Research shows that：discharge power basically presents linear growth relationship with the increase of input power．There is making no difference of TTIP and 02 partial pressure on the discharge power，it is 3 W～4 W．The OES of these three discharge system，the experimental results that Ar atomic excitation temperature reduces with the increase of Ar flow rate，the salne as 02 partial pressure at Ar+02 and TTIP+A r十02 discharge，but it is increased and oxygen spectral line intensity increase in turn witll input power increase． 2．In this experiment，at room temperature,low-pressure plasma Was applied to synthesize Ti02 thin films．Tetraisopropyl titanate(TTIP)Was titanium source and oxygen was oxygen source．The influence of discharge conditions on the preparation of the photocatalytic activity of Ti02 Wills investigated．With．m investigated range the results as follows：with the 02 and TTIP partial pressure．input power and the deposition time increasing the photocatalytic activity of Ti02 film increases firstly and then decreases，FTIR spectra showed that the preparation of thin films contain OH functional groups，the hydroxyl content is consistent with the photocatalytic activity of thin films，the hydroxyl content in