等离子体物理基础(英)Lecture 03-Introduction to Plasma Chemistry-1.pdfVIP

Lecture 03 Introduction to Plasma Chemistry 等离子体化学简介 A. The purpose of Plasma Chemistry in Materials Surface Modification 材料表面改性中等离子体化学的 目的 B. Revisit Hot Filament CVD of Diamond Films 热丝化学 气相沉积金刚石薄膜中的等离子体化学 C. Classifications of plasma chemical reaction等离子体化 学反应的分类 1. Gas Phase Reaction: Homogeneous 气相反应：均 相反应 2. Surface Reaction: Heterogeneous 表面反应：非均 相反应 D. The Plasma Chemistry in Materials Surface Modification 材料表面改性中的等离子体化学 1 Plasma Lectures A. The purpose of Plasma Chemistry An example of CH +H Plasma for Diamond and/or Diamond- 4 2 Like Carbon (DLC) Thin Films Deposition Possible Ingredients: * * H , H, H , H 2 2 CH , CH , CH , CH, C, C , etc. 4 3 2 2 H2+, H+ + + + + + + CH4 , CH3 , CH2 , CH , C , C2 Electrons, Photons Plasma is called a mini-chemical factory 2 Plasma Lectures Plasma Chemistry will tell us the mechanisms of materials Surface Modification 等离子体化学的研究可以告诉我们材料表面改性的机理 3 Plasma Lectures B. Revisit HF CVD of Diamond Film •The reactor acts as a Chemical Soup‘ • Molecules are dissociated into small fragments, radicals and atoms. • Creates a sea of H atoms‘ which attacks the H-terminated diamond surface.