三氧化钨及其掺杂与复合纳米材料的制备和光催化性能研究.pdfVIP

三氧化钨及其掺杂与复合纳米材料的制备和光催化性能研究.pdf

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符号说明 WO :tungsten trioxide ,三氧化钨 3 TiO :Titanium dioxide 二氧化钛 2 S-WO :sulfur doped tungsten trioxide,硫掺杂三氧化钨 3 VB :valence band ,价带 CB :conduction band ,导带 Eg :energy gap ,能隙 MB :methylene blue ,亚甲基蓝 XRD :X-ray diffraction ,X-射线衍射分析 SEM:Scanning electron microscopy ,场发射扫描电子显微镜 XPS :X-ray photoelectron spectroscopy ,X-射线光电子能谱 UV-Vis DRS :UV-visible diffuse-reflectance spectrum ,紫外-可见漫反射光谱 BET :Brunauer Emmett and Teller surface area ,BET 比表面积 MET :Metoprolol ,美托洛尔 目录 中文摘要·····························································································I 英文摘要···························································································III 1 前言································································································1 1.1 研究背景及意义···············································································1 1.2 光催化反应原理···············································································2 1.3 提高光催化性能的方法······································································2 1.3.1 控制晶相结构与缺陷······································································4 1.3.2 尺寸和形貌的控制·········································································5 1.3.3 金属/非金属离子掺杂·····································································6 1.3.4 表面贵金属负载············································································7 1.3.5 半导体异质结复合·········································································7 1.4 三氧化钨的基本特性及制备方法··························································8 1.4.1 三氧化钨的基本特性······································································8 1.4.2 三氧化钨的制备方法····································································10 1.5 研究目标及内容·············································································11 1.5.1 研究目标 ············

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