(2.6.3)--6.2半导体技术导论.pptVIP

6.2 Chemical Vapor Deposition Fundamentals of CVDCharacteristics of CVDLPCVDPECVDMOCVD Fundamentals of CVDA kind of chemical growing methodIntroduce one or several kinds of elemental gas to compose thin film on substrateReaction in gas phase or on the surface of substrate.Can be classified by deposition temperature, pressure, temperature of chamber, reaction variety. Fundamentals of CVDProcess of CVDDiffusion Adhesion ReactionBy-product Characteristics of CVDProducts can be semiconductor, metal, oxide, and alloy.Deposition rate is highDeposition is always carried in low vacuum or atmosphere