微电子技术论文7600855.pdfVIP

  • 0
  • 0
  • 约2.73万字
  • 约 2页
  • 2026-08-11 发布于浙江
  • 举报

AccuratedryetchingtechniqueforphotoresistmaskandspincoatedontotheGesurface.Lineandspace

germaniumwaveguidebyusingCHF3periodicpatternsformingthewaveguidestructureweredefinedand

basedinductivelycoupledplasmadevelopedusingaphotoresistdeveloper.Waveguidestructureswith

文档评论(0)

1亿VIP精品文档

相关文档