硅工艺总结.pdfVIP

四：总结 超大规模集成电路发展到了亚微米时代，光靠技 术的改进已不能提高产品的成品率，环境净化已 日益显示出重要性。在集成电路成品率方面，70% 是由于污染造成器件失效。而最大的污染物来源 则是操作者本身。 超净车间使用； 操作者的净化； 无人化操作； 等等… 超净车间： 在硅片上附有异物，就会对器件制作带来不良影响。 一般说：当异物大小为加工尺寸的1/5-1/10时就会产生 不利影响。也就是说，对于目前的半导体硅平面技术 而言，0.1µm 以上的异物就是有害物质了。 超净车间的标准早在20 世纪70 年代就由美国定下来 了。它对房间内的温度、湿度、照度、换气方式等均 有严格规定。而级别定义则与房间内尘埃粒子的大小 及数目有直接联系。 例如：Class10,000要求房内粒径大于0.5 µm 的粒子数要 3 ，而粒径大于5 µm 的粒子数要小于 小于10000/ft 6.5/ft3 。以前最高级别是Class100 。 What is a Cleanroom? A clean environment designed to reduce the contamination of processes and materials. This is accomplished by removing or reducing contamination sources. Principles of the Clean Environment ♦Air is highly (HEPA) filtered (99.99% @ 0.3µ) ♦Layout should minimize particle sources in filtered air stream ♦Air flow should remove most particles generated by process Types of Contamination ♦Particulate Dust, skin, hair, makeup… ♦Chemical Oil, grease, metal ions, perfume… ♦Biological Bacteria, fungi, rodents??? ♦Radiation Ultraviolet light… Particle Characteristics ♦50 micron particles are visible ♦Average human hair is about 100 microns ♦Time to fall 1 meter in still air – 33 seconds for 10 micron particle – 48 minutes for 1 micron particle ♦Humans generate 1x105 particles per minute when motionless (fully gowned) ♦Humans can generate 1x106 particles when walking in the cleanroom Contamination Sources ♦People ~75% ♦Ventilation ~15% ♦Room Structure ~5% ♦Equipment ~5% Contamination Control ♦Personnel Control – Dress code – Personal Hygiene – Gowning ♦Environmental Control – Entrance and exit – Materials and supplies – Cleaning and maintenance – Atmospheric Dress code ♦No sleeveless shirts ♦No shorts or ski