聚合单体对制备SiO_x高阻隔性薄膜性能的影响.pdfVIP

SiO x 聚合单体对制备 SiO 高阻隔性薄膜性能的影响 x 周美丽, 陈强, 岳 蕾, 葛袁静 (, 102600) : 论述在食品包装保质保鲜方面, 对普通包装基材PETBOPP等表面采用等 子体化学气沉积 一层 纳米级透明的 SiO 层高阻隔层实验采用 13. 56MHz的射频等 子体装置,分别以四甲基二硅氧烷(TMDSO) x 和六甲基二硅氧烷(HMDSO)为单体氧气为反应气体氩气为电 气体,在载玻片单晶硅片PETBOPP 等包 装基材上沉积硅氧阻隔膜比较了不同单体在制备氧化硅阻隔膜时各种工艺参数影响通过傅立叶红外谱仪 (FTI )分析,扫描电子显微镜( SEM )表征, 研究沉积膜的化学组成和结合状态;采用透湿测试仪测试薄膜的透 湿性能, 研究工艺参数的变化表面的结构变化形貌改变等对薄膜的阻隔性能影响原因 : PECVD; 四甲基二硅氧烷( TMDSO); 六甲基二硅氧烷(HMDSO) ; 高阻隔性薄膜 : TB4843 : A : 1001- 3563( 2006) 06- 0037- 03 In fluence of S iOx Polym erization on th e O bstructing Perfo rm ance ZH OU M eil,i CH EN Q iang, YUE L ei, GE Yuanj ing ( Beijing Institute ofGraphic and Communication, Beijing 102600, China) A b stract: The characterization of silicon oxide ( SiO ) films on PET substrates by plasmaenhanced chem ical 2 vapor depositionwas investigated for transparent barrier application. The films were prepared by interelectrode ca pacitively coupled type apparatus and on conditionsw ith carrier gasA r, O andmonomer 1, 1, 3, 3tetramethyldisi 2 2 loxane(TMDSO) or hexamethyldisiloxane(HMDSO), by discharge frequency of 13. 56. Compared with the different monomer, the film properties, such as compose and structure, roughness, water vapor transm ission rate(WVT ) and oxygen transm ission rate( OT ) are differencew ith the oxygen content and power value. The characteristics of thin filmswere investigated through Fourier transform infrared adsorption