nifesmomn合金膜巨磁阻抗效应的研究.pdfVIP

摘要 难以溅射生长厚膜的问题，成功制备了厚度3¨m的单层膜和每层厚度2,6um的 三明治膜． 单层膜随着厚度的增加呈现非晶态，1000nm以上为完全非晶态。膜的软磁性 能随厚度的增加迅速变差，认为是热应力太大造成的。在基底的横向施加了8000e 的溅射磁场，提高了膜的各向异性。在真空条件下4000C加150e磁场退火1小时 后，样品软磁性能得到较大改善． 制备态样品Cu的扩散深度为4．6nm，400oC退火态样品Cu的扩散深度超过 20nm．Cu的扩散深度呈现随退火温度的升高迅速增加的趋势。制备态双层膜比同 不是非常明显． 用掩膜法制备了每层厚度为2unl和2．6“In的三明治膜，将研究退火前后样 品的GMI效应，包括随磁场、驱动频率、交流幅值的变化。 ～ ， 关键词：巨磁阻抗效应，坡莫謇釜，单层醺，双层旗，三明治膜，软磁性能 Abstract setsof filmshavebeen DC Inthis by magnetron thesis，threePermalloy prepared includeNiFeSiMoMn sputteringdeposition，which single sandwichedfilms．Inorderto filmsandNiFeSiMoMn／Cu／NiFeSiMoMn bilayer increasethethicknessand the of films，low rate improvequalitysputtered deposition havebeen a um films and30nmTabufferonsubstrate result，3 layer adopted．As single umsandwichedfilmshavebeen and2．6u111／2．6urn／2．6 successfullyprepared． of filmtransforms imo Withtheincreaseits thickness，thesingle crystal phase atthe is thickness1000 amorphousphase．Thesampleamorphousphase nrn，however， itssoft becomeWorse．The magneticpropertiesgradually phenomenonoriginates fromthethermalstress．Theresultsalsoshowthe in mostly greatimprovement withthetransve