掺氟金属锡靶材的制备与剖析.docVIP

河北联合大学轻工学院 QINGGONG COLLEGE， HEBEI UNITED UNIVERSITY 毕业论文 设计（论文）题目：掺氟金属锡靶材的制备与研究 学生姓名： 学 号： 专业班级： 学 部：材料化工部 指导教师： 2012年05月20日 摘 要 掺氟二氧化锡导电玻璃（简称FTO玻璃）可以做为ITO导电玻璃的替换用品，广泛用于液晶显示屏，光催化，薄膜太阳能电池基底等方面，市场需求极大。目前生产这种薄膜的主要方法是磁控溅射法。靶材的质量对生产出透光率高、导电率好的FTO薄膜至关重要。 本论文采用粉末冶金法制备FTO靶材，将配制的高纯度的混合粉末（氟和二氧化锡比例分别为5:95、10:90和20:80）研磨十分钟，装入冷压模（Φ30mm）中单向压结，于一定压力下（2~55Mpa）、保压2~10min压制成形，脱模后将压坯至于真空炉中（极限相对真空度?-0.095MPa），在低于基本材料熔点的温度下进行烧结（加热）。主要研究了掺氟量、烧结温度、烧结时间对试样微观形貌、组织结构和致密度的影响。通过对致密度的测定和金相显微组织的观察分析，确定出最佳的掺氟量、烧结温度和烧结时间。 实验结果表明掺氟量5%，烧结温度150℃、烧结时间60min这组参数制备的靶材致密度最高。随掺氟量、烧结温度、烧结时间的增加，晶粒尺寸不断增大。 关键词：FTO ，靶材，粉末冶金，金相 Abstract Fluorine- doped tin oxide conductive glass (FTO) can be used as ITO conductive glass replacement,widely used in liquid crystal display,photocatalysis,thin film solar cell substrate.At present,the production of this film is the method of magnetron sputtering.Target quality to produce high transmittance, good conductivity of FTO film is critical. At this dissertation, powder metallurgy have been used for target material.Preparation of high purity mixed powder (the ratio is5:9.5 and1: 9 and2:8) grinding ten minutes,then put it into mould and Unidirectional pressure node.At some pressure(2-55Mpa)keep pressure 2~10 min and Press forming,After release Die and put the blank in the Vacuum furnace (limit Relative Degree of vacuum -0.095MPa)Sintering at the temperature which below the melting point of the basic material.We discussed the infection of Content of Fluorin 、Temperature and Time to Density. Then confirm the best Content of Fluorin 、Temperature and Time, through Density and Metallographic microstructure.And research the samples microstructure and composition. The experimental results show that Fluorine doped volume 5% temperature 150 ℃ and heating time 60min can make the higher density.With the Content of Fluorin 、Temperature and Time increase,the grain size will increase. Keywords:FTO, Target, Powder metallurgy, Metallogr