垂直扫描白光干涉术用于微机电系统的尺寸表征.pdfVIP

第 27 卷第 4 期 2007 年 4 月 光学学报 AC丁AOP丁ICA SINICA Vol. 27 .No. 4 April. 2007 文章编号: 0253-2239(2007)04-0668-5 垂直扫描白光子涉术用于微机电系统的尺寸表征祷 郭形胡春光陈津平博星胡小唐 (天津大学精密测试技术及仪器国家重点实验室，天津 300072) 摘襄: 随着微机电系统的发展，器件设计和加工过程中的表征成为一个:ì:要问题。提出了将扫描白光干涉表阳 轮廓测最方法用于微结构和器件的几何特性检测上.测量系统采用了米劳搜微干涉仪，利用服电陶瓷物镜纳米定 位器实现费1革方向 100μm 拖围内的精确指t曲，并通过傅盟叶变换算法获取条纹包络峰的位置，进而得到器件的整 体集合尺寸信息，与相移干涉方法相比大大提高了测量拖围。通过测量纳米台阶对该系统进行了精度标定，测量 熏复性在亚纳米最级。最后通过测最微谐振器和微压力传感铸的几何尺寸说明了该方法的功能. 中团分类号: TH741. 4 文献标识码 :A 关键询: 光学测量;微机电系统;扫描白光干涉术 F 包络峰探测算法 p 尺寸表征 Vertical Scanning White-Light Interferometry for Dimensional Characterization of Microelectromechanical System Devices Guo Tong Hu Chunguang Chen ]inping Fu Xing Hu Xiaotang (Stαte KeνLαboratory of Precision Mea8uri叩 Technology αnd In8truments. Tianjín Uní切rsíty ， Tíαnjíη300072) Abstract: As microelectromechanical systems developed rapidly, the issue of mechanical characterization had emerged as a major consideration in device design and fabrication. Scanning white-light interferometry surface profiling for geometrical characterization and device inspection was proposed. The measurement system was based on a Mirau microscopic interferometer , using a piezo objective nano-positionerωrealize accurate scanning in vertical direction in the range of 100μm. Th日 envelope peak position was extracted by fast Fourier transform processing method. and the whole information of device was obtained 嗣 Compared with phase shifting interferometry , it had a large measurement range. The measurement accuracy of the system is calibrated by a step height standard. then measuring repeatability was sub-nanometers leve1. A micro resonator and a micro pressure sensor are employed to illustrate the capabilities of scanning white-light interferometry as a measurement and process characterization ω。1. Key word自: optical measurement; mícroelectromechanical systems; scanning white-light in惚rferometry; envelope 阳ak detection algorithm; dimensional characterization 1 寻| 中 一 日微机电系统 (MEMS)是在半导体技术基础上 发