CMOS工艺培训概要1.pptVIP

NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS GATE DIELECTRIC NWELL PROCESS GATE ELECTRODE NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NMOS S/D FORMATION NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS Page 1 CMOS PROCESSES WELL FORMATION： Single well PWELL （XY0001) NWELL Self-aligned twin well Double photo twin well (XY0002) GATE ELECTRODE FORMATION： Si-G CMOS ( SILICON GATE CMOS ) （POLYSILICON） AL-G CMOS ( METAL GATE CMOS ) （ AL ） Single well Early CMOS IC processing N-well on p-type wafer P-well on n-type wafer High energy, low current ion implantation Thermal anneal and drive-in PWELL PROCESS / NWELL PROCESS LOCOS CHANNEL STOP IMPLANT VT ADJUSTMENT GATE STACK PSG AND REFLOW NWELL PROCESS NWELL Wafer Substrate : P100 NWELL PROCESS RCA: SC1#/SC2#/SC3# NWELL PROCESS Pad Oxidation: buffer layer NWELL PROCESS NWELL PROCESS PHOTOLITHOGRAPH: PATTERN SHIFT AA: ACTIVATION AREA NWELL PROCESS PMOS NMOS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS CHANNEL STOP IMPLANT AA AA FIELD NWELL PROCESS LOCOS: LOCAL OXIDATION OF SILICON NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL: PMOS Substrate NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS NWELL PROCESS WHITE RIBBON EFFECT Page 1 * *