MEMS原理-02-Lithography.pptVIP

* * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * * DI Water Rinse Spindle To vacuum pump Chuck Wafer DI water dispenser nozzle Spin Dry Spindle To vacuum pump Chuck Wafer Ready For Hard Bake Spindle Chuck Wafer Development Developer solvent dissolves the softened part of photoresist Transfer the pattern from mask or reticle to photoresist Three basic steps: Development Rinse Dry Development PR PR PR PR Substrate Substrate Substrate Substrate Film Film Film Film Mask Exposure Development Etching PR Coating Development Profiles Developer