NiZn铁氧体靶材及薄膜的磁性能和微观结构 Magnetic and Structural Properties of NiZn Targets and Thin Film.pdfVIP

NiZn铁氧体靶材及薄膜的磁性能和微观结构 赵晓宁，兰中文，孙科，余忠，蒋晓娜 (电子科技大学电子薄膜与集成器件国家重点实验室，四川成都610054) 品的分析结果表明，随Ni含量增加，样品的x射线衍射峰向高角方向移动，晶格常数和平均晶粒尺寸都单调减 制备的薄膜经800。C退火后，呈尖晶石结构，并沿(400)方向择尤取向；薄膜的饱和磁化强度坛和面内矫顽 力风分别为310kA／m和8．833kA／m。 关键词：NiZn铁氧体；靶材；薄膜；磁性能；微观结构 中图分类号：TM277；0484．4+3文献标识码：A 文章编号：1001．3830(2009)03．0020．04 andStructural ofNiZn andThinFilm Magnetic PropertiesTargets ZHAO Xiao—na Xiao—ning，LAN Ke，YU Zhong—wen，SUNZhong，JIANG State ThinFilmsand KeyLaboratory Integrated ofElectronic Devices,UniversityofElectronic Scienceand 610054,China TechnologyofChina,Chengdu Abstract：The method．thenthe were solidstatereaction NixZnl—xFe204(萨0．2~0．8)ferritetargetsprepaidby effectsofNicontentonthe ofNiZn were basedon on 5zno propertiestargetsinvestigated．Andstudytargets，Ni05Fe204 ferritethinfilmswere on radio preparedsingle-crystaiSi(100)substrate sputtering by frequency(I江)magnetron XRD of materialsshowed theincreaseofNi of technique．The that，with content，diffractiontarget pattemtarget peaks shiftto indicateslatticeconstantand sizedecrease the samples higherangle，which averagegrain monotonously．At condition ferrite a resultsoffilmsannealed has and optimal ofx=0．5~0．6，NixZnl—jFe204target largerBs lower风．T