Mo衬底厚度对Ni-Mn-Ga形状记忆合金薄膜形貌及磁性能的影响 Effects of Mo substrate thickness on the morphology and magnetic properties of Ni-Mn-Ga shape memory thin alloy films.pdfVIP

研究·分析·实验 Mo 衬底厚度对 Ni-Mn-Ga 形状记忆合金 薄膜形貌及磁性能的影响 熊 杰，张敏刚，柴跃生，陈峰华，张海杰 （太原科技大学 材料科学与工程学院，山西太原 030024 ） 摘 要：采用射频磁控溅射法制备不同厚度 Mo 衬底的 Ni-Mn-Ga 薄膜，采用扫描电子显微镜（FE-SEM ）、 原子力显微镜（AFM ）、磁力显微镜（MFM ）、振动样品磁强计（VSM ）以及X 射线衍射仪（XRD ）对其形貌 及磁性能进行观测和分析。实验发现, 制备的 Mo 衬底 Ni-Mn-Ga 薄膜经退火后为 T 型马氏体结构, 且当 Mo 衬 底厚度在 0~200 nm 范围内变化时, 其饱和磁化强度及居里温度呈现先减小后增大的趋势。当 Mo 衬底厚度约为 100 nm 时饱和磁化强度和居里温度具有最低值。薄膜表面颗粒直径随着 Mo 厚度的增大而减小，但在 Mo 厚为 100 nm 时出现增大。 关键词：Ni-Mn-Ga 薄膜；Mo 衬底；表面形貌；磁性能 中图分类号：O484.4+3 文献标识码：A 文章编号：1001-3830(2013)02-0017-04 Effects of Mo substrate thickness on the morphology and magnetic properties of Ni-Mn-Ga shape memory thin alloy films XIONG Jie, ZHANG Min-gang, CHAI Yue-sheng, CHEN Feng-hua, ZHANG Hai-jie College of Material Science and Technology, Taiyuan University of Science and Technology, Taiyuan 030024, China Abstract: Ni-Mn-Ga shape memory thin films were prepared by radio-frequency magnetron sputtering on Mo substrates with different thicknesses. The effects of substrate thickness on t he morphology and magnetic properties of Ni-Mn-Ga th in films were studied by AFM, M FM a nd VSM. T he r esults in dicates that N i-Mn-Ga f ilms w ith Mo substrate are T-type martensite; the saturation magnetization and the Curie temperature of the film decrease first and then increase with increasing Mo substrate thickness in the range of 0-200 nm, with minimum saturation magnetization a nd Curie temperature f or sample w i