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Hillock formation during electromigration in Cu (丘在铜电迁移形成)
Hillock formation during electromigration in Cu and Al thin films:
Three-dimensional grain growth
A. Gladkikh and Y. Lereah
Department of Electronic Devices and Materials, Tel Aviv University, Ramat Aviv, Israel 69978
E. Glickman
Graduate School of Applied Science and Technology, The Hebrew University, Jerusalem, Israel 91904
M. Karpovskia) and A. Palevski
School of Physics and Astronomy, Tel Aviv University, Ramat Aviv, Israel 69978
J. Schubert
Intel, Jerusalem, Israel 91031
Received 18 August 1994; accepted for publication 19 December 1994
The evolution of microstructure in Al and Cu thin film lines during electromigration has been
studied using a transmission electron microscopy. Grain boundary migration was found to be
critically involved in the electromigration induced hillock formation that can be described as a
three-dimensional growth of a single grain. © 1995 American Institute of Physics.
Electromigration EM damage in metal interconnection representation of the damaged areas. In Fig. 2a the region
lines is a serious problem in the microelectronic industry. Al of increased film thickness hillock is clearly seen the
is the most commonly used as an interconnect material; and thicker region is darker due to the absorption contrast. The
Cu is considered to be the most promising alternative for hillock covers a group of several adjacent grains grains 1, 2,
Al.1–4 Recent observations show that the Cu lines may suffer 3, and 4. We have analyzed the hillock structure using a
from the same EM reliability problem as the Al ones.5–8 The goniometer stage which allowed to bring Bragg angle each
goal of our work was to rev
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