抛光液温控装置结构设计及温度场研究.docVIP

抛光液温控装置结构设计及温度场研究摘要： 为精确控制超光滑表面抛光过程中抛光液的温度，根据温控基本原理设计温控装置结构.将用UG建立的温控装置模型导入GAMBIT中进行温度场分析.针对装置内部温度分布不均匀问题，对其结构进行优化：在装置内加入导热隔板将其分为工作区和调温区，制冷器被置于调温区内；将温控装置的外形结构加入过渡圆角.结果表明：优化后的温控装置形成内外环流，工作区温度波动范围为±0.01 ℃，温度分布均匀对称，满足高精度温控的恒温和匀温要求. 关键词： 超光滑表面； 抛光； 温控装置； 温度场； 环流 中图分类号： TG580.692；TB115.1 文献标志码： B Structure design and temperature field analysis of slurry temperature control device ZHANG Linghua， WANG Shaozhi， WANG Junlin （State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Science, Changchun 130033, China） Abstract： To control the temperature of slurry accurately in the process of ultrasmooth surface polishing, the structure of a temperature control device is designed according to the basic principles of temperature control. The model built by UG is imported into GAMBIT to analyze the temperature field. As to the nonuniform temperature distribution inside the device, the structure is optimized. For the optimization, a conductivity separator is placed in the device to divide the space into work area and temperature adjusting area, and the cooler is placed in the temperature adjusting area; transition fillets are added on the shape structure. The results show that inside and outside circulations can be formed in the optimized device, the temperature fluctuation range in the working area is ±0.01 ℃, and the temperature distribution is uniform and symmetrical, which meets the requirement of constant and uniform temperature distribution for high accuracy temperature control. Key words： ultrasmooth surface; polishing; temperature control device; temperature field; circulation 0 引 言 技术的发展对光学与电子领域提出新要求：为减少散射损失、提高抗损伤阈值，大型核聚变反射镜要求光学元件的表面粗糙度的均方根值(Root Mean Square，RMS)小于1 nm；而电子工业领域要求生产出具有完整晶格的大规模集成电路基片.这种要求表面粗糙度为原子量级（亚纳米）且没有晶格破坏的表面被称为超光滑表面. 在超光滑表面加工中，抛光方式可分为传统抛光、新原理抛光和非接触式抛光等；对工件材料的去除作用又分为机械磨削剪切作用、化学作用或二者兼有.［1］非接触式抛光的亚表面损伤层非常浅甚至没有，在超光滑表面加工领域具有优势，其主要的抛光方法如弹性发射加工［2］、动压抛光［3］和浮法抛光［4］等都依靠抛光液带动磨料与