the effect of a multihollow cathode on the self-bias voltage of methane rf discharge used for a-ch depositionmultihollow阴极在自给偏压的影响电压的甲烷射频放电用于ch沉积.pdfVIP

the effect of a multihollow cathode on the self-bias voltage of methane rf discharge used for a-ch depositionmultihollow阴极在自给偏压的影响电压的甲烷射频放电用于ch沉积.pdf

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the effect of a multihollow cathode on the self-bias voltage of methane rf discharge used for a-ch depositionmultihollow阴极在自给偏压的影响电压的甲烷射频放电用于ch沉积

Journal of Modern Physics, 2011, 2, 954-957 doi:10.4236/jmp.2011.29113 Published Online September 2011 (http://www.SciRP.org/journal/jmp) The Effect of a Multihollow Cathode on the Self-Bias Voltage of Methane RF Discharge Used for a-C:H Deposition 1 1 2 S. Djerourou , K. Henda , M. Djebli 1 Laboratoire des Plasmas , Centre de Développement des Technologies Avancées, Baba Hassen, Algiers, Algeria 2Laboratoire de Physique Théorique , Faculté de Physique, USTHB, Algiers, Algeria E-mail : sdjerourou@cdta.dz Received March 9, 2011; revised April 16, 2011; accepted April 28, 2011 Abstract In this work we report the measurement of the self-bias voltage of radiofrequency (RF) capacitevely coupled plasma, with a multihollow cathode and methane precursor, used for amorphous hydrogenated carbon (a- C:H) thin film deposition. The plasma is produced in the incident power and pressure ranges between 20 - 300 W and 10 - 100 mTorr, respectively. It was found that the self-bias voltage V is a linear function of the dc square root of the incident power W . The relationship between the self-bias voltage and gas pressure P is RF  established; this gives an empirical relation for P P  . From this result, the pressure P corresponding to 0

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