“microstructured nanostructures” – nanostructuring by means of conventional photolithography and layer-expansion techniqueu201c微观结构纳米结构u201du2014u2014纳米结构通过传统的光刻和layer-expansion技术.pdfVIP

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“microstructured nanostructures” – nanostructuring by means of conventional photolithography and layer-expansion techniqueu201c微观结构纳米结构u201du2014u2014纳米结构通过传统的光刻和layer-expansion技术.pdf

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“microstructured nanostructures” – nanostructuring by means of conventional photolithography and layer-expansion techniqueu201c微观结构纳米结构u201du2014u2014纳米结构通过传统的光刻和layer-expansion技术

Sensors 2006, 6, 361-369 sensors ISSN 1424-8220 © 2006 by MDPI /sensors “Microstructured Nanostructures” – Nanostructuring by Means of Conventional Photolithography and Layer-expansion Technique Johannes Platen 1, Arshak Poghossian 1,2, * and Michael J. Schöning 1,2 1 Aachen University of Applied Sciences, Jülich Campus, Laboratory for Chemical Sensors and Biosensors, Ginsterweg 1, 52428 Jülich, Germany 2 Institute of Thin Films and Interfaces (ISG-2), Research Centre Jülich GmbH, 52425 Jülich, Germany * Author to whom correspondence should be addressed. Email: a.poghossian@fz-juelich.de Received: 28 August 2005 / Accepted: 4 January 2006 / Published: 7 April 2006 Abstract: A new and simple method for nanostructuring using conventional photolithography and layer expansion or pattern-size reduction technique is presented, which can further be applied for the fabrication of different nanostructures and nano-devices. The method is based on the conversion of a photolithographically patterned metal layer to a metal-oxide mask with improved pattern-size resolution using thermal oxidation. With this technique, the pattern size can be scaled down to several nanometer dimensions. The proposed method is experimentally demonstrated by preparing nanostructures with different configurations and layouts, like circles, rectangles, trapezoids, “fluidic-channel”-, “cantilever”- and meander-type structures. Keywords: Nanostructuring, layer expansion, pattern-size reduction