voltage-driven translocation of dna through a high throughput conical solid-state nanoporevoltage-driven易位的dna通过高通量锥形固态纳米孔.pdfVIP

Voltage-Driven Translocation of DNA through a High Throughput Conical Solid-State Nanopore 1 1 1,2 3 1 1 1 Quanjun Liu *, Hongwen Wu , Lingzhi Wu , Xiao Xie , Jinglin Kong , Xiaofeng Ye , Liping Liu 1 State Key Laboratory of Bioelectronics, Southeast University, Nanjing, China, 2 School of Geography and Biological Information, Nanjing University of Posts and Telecommunications, Nanjing, China, 3 SEU-FEI Nano-pico Center, Key Laboratory of MEMS of ministry of education, Southeast University, Nanjing, China Abstract Nanopores have become an important tool for molecule detection at single molecular level. With the development of fabrication technology, synthesized solid-state membranes are promising candidate substrates in respect of their exceptional robustness and controllable size and shape. Here, a 30–60 (tip-base) nm conical nanopore fabricated in 100 nm thick silicon nitride (Si N ) membrane by focused ion beam (FIB) has been employed for the analysis of l-DNA translocations 3 4 at different voltage biases from 200 to 450 mV. The distributions of translocation time and current blockage, as well as the events frequencies as a function of voltage are investigated. Similar to previously published work, the presence and configurations of l-DNA molecules are characterized, also, we find that greater applied voltages markedly increase the events rate, and stretch the coiled l-DNA molecules into linear form. However, compared to 6–30 nm ultrathin solid-state nanopores, a threshold voltage of 181 mV is found to be necessary to drive DNA molecules through the nanopore due to conical shape