超声处理对电沉积ZnO薄膜结构及发光性能的影响研究.pdf

超声处理对电沉积ZnO薄膜结构及发光性能的影响 471 超声处理对电沉积ZnO薄膜结构及发光性能的影响 韩司慧智。秦秀娟。。卜丽敏。孙学亮。左华通 ((燕山大学环境与化学工程学院，秦皇岛066004)) 后，用x射线衍射和光致发光光谱研究了ZnO薄膜的结构、应力状态和发光性能的变化。结果表明：超声处理后样品的结晶性能变 【关键词】ZnO薄膜超声处理缺陷光致发光 Effectsofultrasonic treatmentonstructureand ofZnOfilms photoluminescence Han—Si Hui—zhi，QinXiu—Juan。，BoLi—Min，Sun，Xue—Li锄g，Zuo Hua—Tong andChemical (EnvironmentalEngineeringCollege，YanshanUniversity，Qinh岫ngd舯066004) ZnOfilmsare cathode inthe ofor- Abstract：Highqualitynanocrystalliuepreparedby eleetrodepositiontechniquepresence the aretreatedriseofultrasonic，thestructure，stressesstateand ganicadditive叩一10．Aftersamples by 0fZnOfilmsarestudied diffractionand results showedthatfortheZnO properties byx—ray photolumiuescencespectrum．The existed lattice tensile8tl{tin inthe into stress， films鹪一depositedprocessedbypost—ultrasonic，the crystal changedi瑚flprefls and of 395 am(uv)and bluebandcenteredat428 snle删曲ratioemission础at 580舢(．ydJow)decreased．Inaddition，a inthe that luminesceme the andblueemissionarecausedthetransitionhum 衄appeared sl弛etmm．Wesuggestedyellow by of valence Voand bandheadandfromZnidefectleveltovalencebandhead． complex Zni(VoZni)to Keywords：ZnOfilm；ultrasonic processed；defect；luminesem脱properties