磁控溅射介绍(英文).pptx

Thin Film Material;With the rapid development of the membrane technology into all kinds of materials, the film has been in a common trend. There are various film materials and they are now commonly used in every filed : superconducting thin film, resistance film, semiconductor film photoelectric magnetic thin film, the magnetic light thin film, etc. ;Experiment equipment;The equipment in my lab ;Power device ;The outdoor of magnetron sputtering outline;Magnetron sputtering deposition;Principle diagram;Thin film materialsNi-Cr alloy ;Characterization ;SEM;AFM;磁控溅射的原理;The electrons in the electric field under the process of acceleration to fly to the substrate and argon atom in the process of collision, ionization out lots of argon and electronics. Electronic to fly to the substrate, argon ion in the electric field under the function of accelerating target materials, sputtering along a lot of target materials, a neutral atoms of target atoms (or molecular) deposition in the substrate into film. Secondary electron in accelerating the process of flying to the substrate by magnetic field, the influence of magnetic force; los was tied to the target near the plasma area, the area plasma density high, secondary electron in the magnetic field around under the action of the target surface to move in a circle, this electronic movement path to a long, in athletic process constantly hit a large amount of ionization argon bombardment target materials, after the collision of Duce after the electronic energy gradually reduced, please the bondage of lines, away from target materials, eventually deposition in the substrate. ;Application;The new film solar cells; Thank you !