磁控溅射电源恒流控制策略研究-电力电子与电力传动专业论文.docxVIP

万方数据 万方数据 Abst Abstract Title: RESEARCH ON CONSTANT CURRENT CONTROL STRATEGY OF MAGNETRON SPUTTERING POWER SUPPLY Major：Power Electronics and Power Drives Name：Chunqiang LIU Signature: Supervisor：Prof. Qiang SUN Signature: Guitao CHEN Signature: Abstract With the increasing demand of new materials, especially in the continuous improvement of wear resistance, heat resistance and other requirement, plasma processing is used widely in the field of material surface treatment. The process raises higher demands for power supply. Improving the anti-disturbance and load adaptability of the power supply has become the main research direction. Firstly, the circuit model of plasma load was introduced. The current controller was designed by frequency domain method, and the discrete methods of bilinear transformation and pole-zero matching were compared. The influence mechanism of output admittance on the load disturbance was discussed. Then, the output voltage feedforward based on plasma load equivalent circuit model was introduced to the current loop. The output voltage feedforward compensation function was deduced to reduce the output admittance, and the influence of plasma equivalent load model parameters on feedforward functions was analyzed. Comparisons between the control with and without voltage feedforward compensation had been presented. The output voltage feedforward control was verified on the magnetron sputtering power experimental platform. Experimental results show that, the proposed control strategy not only effectively restrains the influence of load disturbance on constant current source, but also improves the system dynamic response. Then, in order to solve PI control saturation problem when power supply transformed from no-load to load, the voltage and current switching control was adopted. Using hysteresis loop control mode, no-load voltage control was achieved. No-load to load response curves under current loop PI control and voltage and current loop switc