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- 约12.39万字
- 约 65页
- 2019-06-16 发布于中国
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ABSTRACT
ABSTRACT
Integration of ferroelectric thin films on cheap metals shows great advantages in
many applications. However, big challenges still exist so far. One of the key difficulties
is the control of the interface between the film and the substrate. The metal-oxide layer
easily formed at the interface during the growth of ferroelectric oxide films, the lattice
and thermal mismatch, the interdiffusion bet
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