ASTM F928-93 美国材料与试验协会标准.pdfVIP

Designation:F928–93(Reapproved1999)

StandardTestMethodsfor

EdgeContourofCircularSemiconductorWafersandRigid

DiskSubstrates1

ThisstandardisissuedunderthefixeddesignationF928;thenumberimmediatelyfollowingthedesignationindicatestheyearof

originaladoptionor,inthecaseofrevision,theyearoflastrevision.Anumberinparenthesesindicatestheyearoflastreapproval.A

superscriptepsilon()indicatesaneditorialchangesincethelastrevisionorreapproval.

1.ScopeMeasureofQualityforaLotorProcess3

2providemeansforexaminingthe2.2MilitaryStandard:

1.1Thesetestmethods

edgecontourofcircularwafersofsilicon,galliumarsenide,MIL-STD-105DSamplingProceduresandTablesforIn-

andotherelectronicmaterials,anddeterminingfittolimitsofspectionbyAttributes4

contourspecifiedbyatemplatethatdefinesapermittedzone2.3SEMIStandards:

throughwhichthecontourmustpass.PrincipalapplicationofSEMIM1,SpecificationsforPolishedMonocrystallineSili-

conWafers5

suchatemplateisintendedfor,butnotlimitedto,wafersthat

havebeendeliberatelyedgeshaped.SEMIM9,SpecificationsforPolishedMonocrystalline

1.2Twotestmethodsaredescribed.OneisdestructiveandGalliumArsenideSlices5

islimitedtoinspectionofdiscretepointsontheperiphery,