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IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 63, NO. 2, FEBRUARY 2015 459
A 1.3–2.4-GHz 3.1-mW VCO Using Electro-Thermo-
Mechanically Tunable Self-Assembled MEMS
Inductor on HR Substrate
Anirban Bhattacharya, Student Member, IEEE, Debashis Mandal, Member, IEEE, and
Tarun Kanti Bhattacharyya, Member, IEEE
Abstract— This paper reports implementation and wafer-level On-chip inductors normally exhibit a low factor, mainly due
testing of a self-assembled tunable microelectromechanical sys- to process-limited thickness of the metal layers [4] and strong
tems (MEMS) inductor with electrostatic, electrothermal, and substrate coupling to the inductor loop. However, with the avail-
thermal tuning capability. The surface micromachined inductor
was fabricated on a high-resistivity (HR) substrate ( k cm) ability of several attractive choices for enhancing the factor
using a doped polysilicon and Au–Cr metal combination as a like use of a thick metal layer, use of micromachining for sub-
bimorph structural layer for providing self-assembled elevation strate etching [5]–[7], and so on, microelectromechanical sys-
with an enhanced factor. Extensive electro-thermo-mechanical tems (MEMS) based inductors clearly outperform their on-chip
and RF characterization was carried out for the inductor, the counterparts in terms of achievable factor and it is also easier
latter over a temperature range from 30 C to 150 C. Further-
more, the tunable inductor was integrated in the tank circuit of to impart tunability in those, which can be utilized for
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