Si基底磁控溅射制备CrN薄膜表面形貌和生长机制研究.pdfVIP

P5 Si 基底磁控溅射制备 CrN 薄膜表面形貌与生长机制研 究 谈淑咏 张旭海 吴湘君 蒋建清 (东南大学材料科学与工程学院；江苏省先进金属材料高技术研究重点实验室， 江苏南京 211189) 摘要：CrN 薄膜硬度高、高温抗氧化性、耐磨性及抗腐蚀性能好，越来越受到重视。目前采用磁控溅 射法制备 CrN 薄膜的研究主要集中在制备工艺、合金化、多层化以及性能和应用等方面，对 CrN 薄 膜的生长以及表面形貌演变的认识还不够深入。在 Si 基底上采用直流磁控溅射法制备 CrN 薄膜，利 用原子力显微镜（AFM ）、扫描电镜（SEM）和X 射线衍射（XRD ）分析薄膜表面形貌和物相成分， 探讨了薄膜生长的动力学过程。结果表明，只有当生长时间足够长（1800s）时，才能形成具有 CrN 相的薄膜。随着 CrN 薄膜的生长，薄膜表面晶粒由三棱锥发展为三棱锥与胞状共存状，薄膜表面粗糙 度逐渐增大，动力学生长指数 β=0.50 。 关键词：直流磁控溅射;表面形貌;粗糙度;生长指数 Study on surface morphology and growth mechanism of magnetron sputtered CrN films on silicon substrate TAN ShuYong，ZHANG XuHai ，WU XiangJun ，JIANG JianQing （School of Material Science and Engineering ,Southeast University; Jiangsu Key Laboratory of Advanced Metallic Materials, Nanjing 211189, China) Abstract: CrN films have attracted more and more attention because of high hardness, good high-temperature oxidation resistance, wear properties, and corrosion resistance. At present, the study on magnetron sputtered CrN films mainly focuses on the deposition technology, alloying, multilayer, performance and applications, etc. However, the relationship between growth and surface evolution of CrN films has not been well understood. CrN films were deposited on silicon substrate by DC magnetron sputtering. Atomic Force Microscope (AFM), Scanning electron microscope (SEM) and X-Ray Diffractomer (XRD) were used to analyze film surface morphology and phase structure. The dynamics of film growth processes was investigated. The results show that CrN films are formed only when the deposited time is enough (1800 s). With the films growing the surface grains change from pyramidal st