CBD-CdS薄膜过程暂态分析.pdfVIP

CBD-CdS薄膜过程暂态分析 蔡殉·李文漪陈秋龙于会生 上海交通大学教育部高温材科及高温测试开放实验室 摘要：本文通过原子力显微镜(AFM)和多重分形的分析方法对CBD制各Cds薄膜生长的研究．成功铜各出结构 紧密的CdS薄膜．研究了强制搅拌对薄膜生长行为的影响．研究表明：在反应初期．随着沉积时问的增加，CdS薜膜多 重分形谱的宽度增加，Af增大．薄膜沉积表面高度分布随着沉积时同的增加，不均匀性显著增加．随着沉积的不断继 续．CdS薄膜在水平和垂直方向生长并逐渐形成连续致密的镀层．其中。CdS薄膜生长后期表现出异常的多重分形 的变化(rms减小．多重分形谱变窄)，该现象的出现由磁力搅拌以及CdS薄膜反应机理造成的． 关键词：多重分形，CdS．原子力显徽镜．化学浴沉积 TransientofCBD．CdS analysis process withmultifractal method CAI Xun，LIWenyi，Chen Qiulong。YuHuisheng Lab．ofthe ofEducationfor Materialsand (Key Ministry HighTempemmm Testing, ShangIlaiJiaoTongUniversity,Shanghai200030，China of Abstrate：nesurface CdSfilms withchemicalbath indifferent morphology deposited deposition time WaSmeasuredwithatomicfoice withmultifractal microscopy(AFM)andanalysed method．111eresults that be could usedtocharacterizethe ofchemicalbath multifractalitysuccessfully growth proved process CdSfilms．Atthe of thatthe deposition(CBD)forbeginningdeposition,multifractalspectratla)show the widerthe the theAf．Itis thatthe longerdepositiontime，the spec仇lm，andlarger apparent ofthe distributionincreaseswiththe accord nonuniformity time，whichwith height increasingdeposition the ofAFM andthe multifractalofCdSfilms appearanceimages roughness(rms)．111espectra depos