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《Large-signal characterizations of DDR IMPATT devices based on group Ⅲ-Ⅴ semiconductors at millimeter-wave and terahertz frequencies》.pdf

《Large-signal characterizations of DDR IMPATT devices based on group Ⅲ-Ⅴ semiconductors at millimeter-wave and terahertz frequencies》.pdf

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《Large-signal characterizations of DDR IMPATT devices based on group Ⅲ-Ⅴ semiconductors at millimeter-wave and terahertz frequencies》.pdf

Vo1.35,No.8 JournaJofSemiconductors Auoust2O14 Large-signalcharacterizationsofDDR IM PATT devicesbasedongroup ⅡI—V semiconductorsatmillimeter-waveandterahertzfrequencies AritraAcharyya ,AlivaM allik2, DebopriyaBanerjee2,SumanGanguli2,ArindamDas2, SudeeptoDasgupta2 . andJ.PBanerjee 1InstituteofRadioPhysicsandElectronicsUniversityofCalcutta,92,APC Road,Kolkata700009,India , 2SupremeKnowledgeFoundationGroupofInstitutionsMankundu,Hooghly,W estBengal712139,India , Abstract:Large-signalfL.S)characterizationsofdouble.dr[ftregion(DDR)impactavalanchetransittimefIM. PATT)devicesbasedongroupIII—_Vsemiconductorssuchaswurtzite(Wz)GaN,GaAsandInPhavebeencarried outatbothmillimeter-wave(mm—wave)andterahertz(THz1rfequencybands.AL—Ssimulationtechniquebased onanon-sinusoida1voltageexcitation(NSVE)modeldevelopedbytheauthorshasbeenusedtoobtainthehigh rfequencypropertiesoftheabovementioneddevices.Theeriectofband—to—bandtunnelingofftheL.Spropertiesof thedeviceatdilyerentmm.waveandTHzrfequenciesarealsoinvestigated.Similarstudiesarealsocarriedoutfor DDRIMPATTsbasedonthemostpopularsemiconductormateria1.i.e.Si.forthesakeofcomparison.A compara. tivestudyofthedevicesbasedonconventionalsemiconductormaterialsfi.e.GaAs.InPandSi)withthosebasedon Wz-GaN showssignificantlybetterperformancecapabilitiesofthelatteratbothmm—waveandTHzrfequencies. Keywords:DDR IMPATTs;GaN;group III—V:large—signalsimulation;millimeter-wave;terahertzregime; wurtzite DoI:10.1088/1674—4926/35/8/084003 EEACC:2520

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