《Large-signal characterizations of DDR IMPATT devices based on group Ⅲ-Ⅴ semiconductors at millimeter-wave and terahertz frequencies》.pdf
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《Large-signal characterizations of DDR IMPATT devices based on group Ⅲ-Ⅴ semiconductors at millimeter-wave and terahertz frequencies》.pdf
Vo1.35,No.8 JournaJofSemiconductors Auoust2O14
Large-signalcharacterizationsofDDR IM PATT devicesbasedongroup ⅡI—V
semiconductorsatmillimeter-waveandterahertzfrequencies
AritraAcharyya ,AlivaM allik2, DebopriyaBanerjee2,SumanGanguli2,ArindamDas2,
SudeeptoDasgupta2
. andJ.PBanerjee
1InstituteofRadioPhysicsandElectronicsUniversityofCalcutta,92,APC Road,Kolkata700009,India
,
2SupremeKnowledgeFoundationGroupofInstitutionsMankundu,Hooghly,W estBengal712139,India
,
Abstract:Large-signalfL.S)characterizationsofdouble.dr[ftregion(DDR)impactavalanchetransittimefIM.
PATT)devicesbasedongroupIII—_Vsemiconductorssuchaswurtzite(Wz)GaN,GaAsandInPhavebeencarried
outatbothmillimeter-wave(mm—wave)andterahertz(THz1rfequencybands.AL—Ssimulationtechniquebased
onanon-sinusoida1voltageexcitation(NSVE)modeldevelopedbytheauthorshasbeenusedtoobtainthehigh
rfequencypropertiesoftheabovementioneddevices.Theeriectofband—to—bandtunnelingofftheL.Spropertiesof
thedeviceatdilyerentmm.waveandTHzrfequenciesarealsoinvestigated.Similarstudiesarealsocarriedoutfor
DDRIMPATTsbasedonthemostpopularsemiconductormateria1.i.e.Si.forthesakeofcomparison.A compara.
tivestudyofthedevicesbasedonconventionalsemiconductormaterialsfi.e.GaAs.InPandSi)withthosebasedon
Wz-GaN showssignificantlybetterperformancecapabilitiesofthelatteratbothmm—waveandTHzrfequencies.
Keywords:DDR IMPATTs;GaN;group III—V:large—signalsimulation;millimeter-wave;terahertzregime;
wurtzite
DoI:10.1088/1674—4926/35/8/084003 EEACC:2520
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