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Excess silicon at the silicon nitride thermal oxide interface in oxide
Excess silicon at the silicon nitride/thermal oxide interface in
oxide–nitride–oxide structures
V. A. Gritsenko, Hei Wong, J. B. Xu, R. M. Kwok, I. P. Petrenko et al.
Citation: J. Appl. Phys. 86, 3234 (1999); doi: 10.1063/1.371195
View online: /10.1063/1.371195
View Table of Contents: /resource/1/JAPIAU/v86/i6
Published by the American Institute of Physics.
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JOURNAL OF APPLIED PHYSICS VOLUME 86, NUMBER 6 15 SEPTEMBER 1999Excess silicon at the silicon nitride/thermal oxide interface
in oxide–nitride–oxide structures
V. A. Gritsenko
a)
Institute of Semiconductor Physics, Novosibirsk 630090, Russia
Hei Wong
Department of Electronic Engineering, Cityu, 83 Tat Chee Avenue, Kowloon, Hong Kong
J. B. Xu and R. M. Kwok
Chinese University of Hong Kong, Shatin, Hong Kong
I. P. Petrenko and B. A. Zaitsev
Institute of Semiconductor Physics, Novosibirsk 630090, Russia
Yu. N. Morokov
Institute of Computational Technologies, Novosibirsk 630090, Russia
Yu. N. Novi
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