CTP磁控溅射镀膜生产线详细方案书(国外英文资料).doc

CTP磁控溅射镀膜生产线详细方案书(国外英文资料) Page 1, a sixCTP magnetron sputtering production line plan The overall structure of the production line of the 1.1 vertical magnetron sputtering coating Manufacturers Production  model HD - skyriver - 2011 - X Vertical magnetron sputtering coating production line design for inlet chamber for the first part of seven chamber structure   in the second part Imported buffer room  the third part is the transfer chamber  in the fourth part is the art and craft room (according to the fabrication and installation conditions To determine into several section) for export delivery room   section 5 the sixth  buffer rooms on the seventh part is divided into exports For export chamber  in the fourth part of the art and craft room configuration can realize SiO2 + ITO and Mo  A l  Mo coating product  Its configuration is 3 to intermediate frequency plane cathode target  SiO2  closed-loop control using piezoelectric valve forming quality of SiO2 Film  8 a cathode install six plane cathode plane cathode  a cathode  reserved two  the DC electricity Source to realize high quality of Mo  A l  Mo or ITO transparent conductive film  equipment design processing size 4 pieces of 550 mm 0.3 3 mm * 670 mm *   flat glass substrate material mechanical beats for $75 or less s   production line Adopting the advanced design of molecular pump suction forming atmosphere isolation  production line equipped with 18 Japan island ferry The TMP - V2304LM maglev molecule pump is used to achieve efficient steady pumping and uniform distribution of gases. 1 size   equipment design Vacuum cavity  27 m  the total length of body will be subject to the actual design   Craft room    L  13500 mm x 13500 mm H  * 1   500 W  actual design   The coating chamber    L  1750 mm x 1750 mm H  * 6   500 W  actual design   Flashboard valve    L  150 mm x 150 mm H  * 4   500 W  actual design   The flap valve    L  150 mm x 150 mm H 