氧分压对TiO2薄膜微观结构与光吸收性能的影响-中南大学学报.PDFVIP

第 39 卷第 1 期 中南大学学报自然科学版( ) Vol.39 No.1 2008 年 2 月 J. Cent. South Univ. (Science and Technology) Feb. 2008 氧分压对TiO2 薄膜微观结构与光吸收性能的影响 杨兵初，高 飞，刘晓艳，张 丽 ( 中南大学 物理科学与技术学院，湖南 长沙，410083) 摘 要：采用直流磁控溅射法在不同氧分压下制备 TiO2 薄膜；研究氧分压对 TiO2 薄膜的表面形貌、晶体结构、 化学组分及光吸收性能的影响。研究结果表明：Ti 在所有样品中均以+4 价态存在；随着氧分压的增大，TiO2 薄 膜颗粒逐渐变大，薄膜的结晶质量随着氧分压的增大逐渐提高；在吸收光谱中，300 nm 附近的紫外吸收峰随着氧 分压的增大而减弱，在 330~465 nm 范围内出现 1 个吸收谷，且该吸收谷随着氧分压的增大而减小，当氧分压达 到 0.8 Pa 时，吸收谷基本消失。 关键词：TiO2 薄膜；氧分压；+4 价钛；吸收特性 中图分类号：O484.4; O484.5 文献标识码：A 文章编号：1672-7207(2008)01−0064−05 Effect of oxygen partial pressure on microstructure and absorption characteristics of TiO thin films 2 YANG Bing-chu, GAO Fei, LIU Xiao-yan, ZHANG Li (School of Physics Science and Technology, Central South University, Changsha 410083, China) Abstract: TiO2 thin films were prepared by DC reactive magnetron sputtering with different oxygen partial pressures. The effect of oxygen partial pressure on the morphology, crystallinenature, chemical composition and optical absorption was studied. The results show that titanium atoms exist as Ti4+ in all the samples. With the increase of oxygen partial pressure, the crystal size grows by degrees and the crystal quality improves as well. In absorption spectrum, the intensity of ultraviolet peak located at 300 nm decreases with the increase of oxygen partial pressure. An absorption vale exists between 330−465 nm in every sample and its intensity decreases with the increase of oxygen partial pressure. When the oxygen partial pressure is up to 0.8 Pa, the vale almost disappears. Ke