TiN膜离子注入与沉积工艺研讨.pdfVIP

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  • 2018-01-11 发布于广东
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等离子拥I技术 on Ion and Study Implantation Deposition ofTiNFilms Technology Huafang Wu,Yanli ia Zhang,HongchenJiang,Guoj Ma,LipingPeng National for Beam KeyLaboratoryHighEnergyDensityProcessingTechnology filmsareobtainedionim— [ABSTRACT]TiN andelastic by (includingplastic bemea. properties)can or combinationofthemsured without the planration,depositionprocessby directly filmfromthesub— separating onSisubstrate.TheofTiN qualities filmsarestudiedstrate.Nanoscratchmethodisanadvanced method, meansofnanoscratch isusedtoobservewhichcanmeasurethemechanical by test,SEM within propertytiny thescratch resultsshowthat volume. morphologies.The dynam— iccombinationofion and Inthe the can implantationdepositionprocess presentstudypowersupply can increasethe betweenthe differentbias modes,thusmultiform prominently jointproperty voltage filmsandsubstrate.

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