- 6
- 0
- 约3.15万字
- 约 5页
- 2018-01-11 发布于广东
- 举报
等离子拥I技术
on
Ion and
Study Implantation
Deposition ofTiNFilms
Technology
Huafang Wu,Yanli ia
Zhang,HongchenJiang,Guoj
Ma,LipingPeng
National for Beam
KeyLaboratoryHighEnergyDensityProcessingTechnology
filmsareobtainedionim—
[ABSTRACT]TiN andelastic
by (includingplastic bemea.
properties)can
or combinationofthemsured without the
planration,depositionprocessby directly filmfromthesub—
separating
onSisubstrate.TheofTiN
qualities filmsarestudiedstrate.Nanoscratchmethodisanadvanced
method,
meansofnanoscratch isusedtoobservewhichcanmeasurethemechanical
by test,SEM within
propertytiny
thescratch resultsshowthat volume.
morphologies.The dynam—
iccombinationofion and Inthe the
can
implantationdepositionprocess presentstudypowersupply
can increasethe betweenthe differentbias modes,thusmultiform
prominently jointproperty voltage
filmsandsubstrate.
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