偏压对磁控溅射制备almg发b薄膜的影响-凝聚态物理专业毕业论文.docxVIP

偏压对磁控溅射制备ALMgB薄膜的影响Bias 偏压对磁控溅射制备ALMgB薄膜的影响 Bias Effects on A1MgB Thin Films Prepared by Magnetron Sputtering Ab stract Considerable attention has been paid to a new kind of superhard materials,ternary A1MgB 14 composite，in recent years．With unique mechanical，thermal，and electrical properties，A1MgB 14 has been seen as a promising candidate material in protective coating of cutting tools and microelectromechanical components．In this paper，AIMgB thin films were deposited on Si(1 00)substrates by a three target magnetron CO—sputtering system．We explored effects of pulse negative bias voltage，duty cycle and DC superimposed pulse bias voltage on thickness，morphology，microstructure，mechanical property of A1MgB thin film in details． Amorphous A1MgB thin films were successfully prepared at different pulse negative bias voltages．The A1MgB thin films prepared at high negative bias voltage were found to be generally dense and containing more well-formed Bu icosahedra．These characteristics contribute to the hardness of the deposited films，which Can reach 22．6 GPa and the corresponding elastic modulus is 240 GPa at the negative bias voltage of 400 V．These hard films have a roughness value of O．89 nm，which is atomically smooth surface．However，the A1MgB thin films prepared at low negative bias voltages exhibit a loose microstructure， coarse surface，and contain few B 12 icosahedra． Amorphous AIMgB thin films were prepared at different duty cycle．The surface morphology of AIMgB thin films was destructed leading to a large area of the thin fills failing off from the substrates and the property becoming worse at duty cycle。The adhesion strength of the thin films decreases as well．In addition，AIMgB thin films contain less B 12 with increasing the duty cycle，leading to the decrease of hardness and elastic modulus of AIMgB thin film． Amorphous A1MgB thin fills were prepared at different superimposed pulse negative bias voltage。It is shown that the variation of the property of AIMgB thin