基于Minitab磷扩结深一致性和均匀性数据分析及优化-软件工程专业论文.docxVIP

I I PAGE PAGE IV 摘 要 N 型衬底扩散工艺是目前衬底制备中的常用工艺，被广泛应用于三极管、 MOS 管等分立器件的加工工艺中。本文主要就车间 N 型衬底扩散工艺中，长期 存在的生产周期长，一致性、重复性差，质量水平低等一系列问题，就其产生 的可能原因在设备状态和工艺方法上进行了详细的分析，并根据情况提出解决 的途径。通过在扩散炉设备和工艺上的实施，使 N 型衬底扩散的工艺水平和质 量水平获得突破性的飞跃，本论文主要内容包括： 1．对现行 N 型衬底扩散工艺下，二次分布一致性和均匀性差的原因进行了 分析； 2．研究了在测试炉管内恒温时温度产生波动的原因，对其原因进行分析， 在分析的基础上对扩散炉设备进行了硬件上的改善，尽量保证了扩散温度的稳 定； 3．改变液态磷源-三氯氧磷的温度，以及改变携带源的氮气的流量，通过 测试方块电阻，分析了源温高低和源氮流量大小对衬底预扩均匀性的影响，同 时分析了扩散气流方向以及大小、扩散温度、扩散时间等对扩散质量的影响， 选择了合适的工艺参数。 关键词：衬底预扩，二次分布，均匀性，温偏 ABSTRACT N-type substrate diffusion process is the preparation of the common substrate technology, and it is widely used in transistors, MOS tube and other discrete devices in the craft. In this paper, we will discuss the following questions, such as the long production cycle length, consistency, poor reproducibility, low level of quality range on the workshop process. We analyze the possible causes in detail and propose solutions to the channel under the circumstances. By diffusion furnace equipment and process improvements, so that the spread of N-type substrate level of craftsmanship and quality leap breakthrough .This thesis include: In the current N-type substrate diffusion process, we have consistency and uniformity of the secondary distribution of the causes of poor analysis; Studied the causes why the temperature fluctuate in the test tube. Analysis of its causes, and based on the analysis, we improve the hardware of the diffusion furnace equipment, as far as possible to ensure the stability of the diffusion temperature; Changes the temperature of liquid phosphorus - phosphorus oxychloride, and changes the flow of the nitrogen for bringing the source. BY testing the sheet resistance, we analyze the effect. Also analyzed the effect including airflow direction and size, diffusion temperature, diffusion time on the proliferation of quality, choose the appropriate parameters. Keywords: substrate pre-expansion, secondary distribution, uniformity, temperature and partial III III PAGE PAGE IV 目