接触型局域SP光刻直写设备中的散热研究-机械电子工程专业论文.docxVIP

I I 摘要 摘要 光刻技术在半导体工业中一直扮演核心技术的角色，但衍射极限的存在限制 传统光学光刻在光刻分辨率上的提高。基于表面等离子体激元的近场光刻能够突 破衍射极限并具有透射增强效应，使得光刻分辨率及成像质量得到明显提高。等 离子体直写光刻作为表面等离子体光刻中的一种，能够实现任意图形的刻写且成 本较低，值得研究开发。 本文来源于国家重点实验室开放课题“接触型局域 SP 光刻直写头设计和扫描 性能分析研究”，根据课题需求，必须对光刻直写设备中存在发热现象的物件进 行相关散热研究。本文从传热学和流体方程相关理论出发，吸取国内外光刻设备 散热经验，对光刻直写设备中光刻头的薄膜结构进行散热性能分析并对用于投影 物镜等散热的循环水冷装置进行深入研究。 本文对在自然风冷中处于工作状态的金属-介质多层膜及单层铬膜进行热分 析，得到薄膜结构瞬态温度场分布规律及光照功率密度对薄膜温度场的影响关系， 确定不需要采用其它制冷方式，并研究金属-介质多层膜散热特性中存在的尺寸效 应。对用于投影物镜等散热的循环水冷装置进行总体设计，构建由制冷模块、加 热水箱、泵、循环管路等组成及采用热电制冷方式的循环水冷系统。完成制冷模 块的设计，深入研究分叉流道结构参数对流道流动及换热性能的影响，设计并优 化仿生流道；对换热器流道结构进行对比选择，使用有限元分析软件对采用平行 流道、蛇形流道、仿生流道的换热器分别进行流场-温度场耦合仿真分析计算，通 过对比换热器出口处水温，选择制冷效果最优的仿生流道作为换热器流道结构， 讨论材料及边界条件对制冷模块制冷效果的影响，优化换热器相关参数，达到较 高热交换效率的目的。 关键词：等离子体光刻，金属-介质多层膜，热分析，仿生流道 I II ABSTRACT ABSTRACT Optical lithography has played the key role in the progress of semiconductor manufacturing industry, but because of the existence of the diffraction limit, the resolution of traditional optical lithography is limited. Recently, people find the near-field lithography developed on the basis of surface plasmons polaritons(SPPs) can break through the diffraction limit and enhance the transmission of light, it improves the resolution and image quality of lithography obviously. As a kind of the surface plasmon lithography, surface plasmons direct writing lithography can fabricate arbitrary patterns and it cost low, it has the good development value for the production of chip, so we need to study it. In this paper, this study roots in the “Design and scanning performance analysis of contact localized SP lithography direct writing probe”, which is the open project of State Key Laboratory. According to the demand of project, the heat dissipation of hot object in photolithography direct writing device must be studied. Based on the related theory of heat transfer and fluid equation, the thermal performance of film structure in direct writing lithography equipment was analyzed and circulating water cooling device for cooling the projection