光学材料折射率均匀性的子孔径拼接技术研究-光学工程专业论文.docxVIP

f f §百。岩攀拦翟 硕七论文 摘 要 随着科学技术的发展，大口径光学系统被广泛应用在各个领域，对大口径光学材料 的要求亦越来越高，其中材料光学均匀性是一个主要的测试指标。由于我国口径在 600ram以上的1二涉仪数量极其有限，针对日益迫切的需求，本文采用子孔径拼接方法 对大口径光学材料的均匀性进行干涉绝对检验。 本测量过程是一种双重多对象f涉检验：光学材料的折射率均匀性干涉测量是一种 四步法的多对象F涉检验的绝对测最，而针对大尺寸石英平晶(①500ram)采用子孔径 分区测试后再拼接的方法就成为另一重的多对象干涉检验。本文在下述几个方面对折射 率均匀性的子孔径拼接测试系统进行了研究：首先通过对光学均匀性干涉绝对测量方法 原理以及子孔径拼接原理算法与拼接模式的选择方案的探讨，确立了系统的测试要求与 步骤；其次研究了子孔径拼接过程中数据处理方法，提出采用循环拼接过程中残差的最 小二乘拟合法降低运算量、提高了拼接精度，利用加权平滑拼接算法使得拼接区域平滑 过渡、控制了拼接痕迹，并通过对拼接软件的仿真测试，验证了拼接程序的可行性。最 后构建了实用的子孔径拼接测试系统，包括实验装置以及拼接程序，并对实际子孔径拼 接测试过程中的误差进行分析。 关键词：光学均匀性，子孔径拼接，误差分析 AbstractWith Abstract With the development of science and technology,large optical systems are widely used in various fields，the homogeneity,as a important parameter of the optical glass，which was required to improve accuracy of the surface．Now in Our country the number of interferometer which diameter larger than 600mm is very small，but the demand for it is urgently increasing， SO we need to use the absolute method of subaperture stitching to measure the homogeneity of large optical materials． The measurement process is a double multi．object interferometry：As all absolute measurement for t11e homogeneity of glass，it is a four steps multi—object interferometry,but for large size(F 500mm)of flat quartz crystal then we need sub．aperture stitching testing．In this paper,the following aspects were studied：First,through the intervention of the principle of the homogeneity by absolute interferometry and the sub—aperture stitching algorithm and splicing pattern of the options，to establish the requirements and procedures of the system testing；Second，in order to improve the accuracy of stitching，We studied the process of the data processing method,by using the least squares fitting to reduce the residuals of circulating stitching process，also used the weighted average smoothing algorithm to smooth overlap ， region，SO the stitching traces were well controlled，and through the simulation of the software we verified the correctness of the alg