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Femtosecond laser induced defects in various silica glasses.pdf
维普资讯
246 CHINESEOPTICSLETTERS} o、.2No.4}April102004
m tosecond laser0ind1uced1d1et^ect-si●n varl●ousSl●l1l●Cagl1asses
QinlingZhou (周秦岭) ,LiyingLiu (刘丽荚),LeiXu (徐 雷),WenchengWang(王文澄),
JianrongQiu (邱建荣)。,CongshanZhu (朱从善)。,andFuxiGan(干福熹),。
ShanghaiInstituteofOpticsandFineAlechanics,ChineseAcademyofSciences,Shanghai201800
。StateKeyLabforAdvancedPhotonicMaterialsandDevices Departm entofOpticalScienceandEngineering,
,
FudanUniversi Shanghai200433
。PhotonCraftProject,ShanghaiInstituteofOpticsandFineMechanics,ChineseAcademyofSciences,Shanghai201800
Recei~edJanuary 8.2004
Themechanism ofnearinfraredfIR)focusedfemtosecond ffs)laserinduceddefectsinsilicaglasses
produced by different methods is systematically investigated through m easurem ents ofabsorption
fluorescence,andelectronicspinresonancefESR)spectra.Theinfluenceofimpuritiesand hydroxyl
groupsondefectsisdiscussed.Theresultsshow thatESsilicaglassescontaininghighOH andfew defects
axemuchstableunderfslaserirradiation.Itisalsoverified thatSiE centerformation has nodirect
relationwithchlorideions.
OCIscodes:320.7130 160.2750.300.6250.
High puritysilicaglassiswidelyused in lasersystems couldbemonitoredbyachargecoupleddevicefCCD)
aslensesorotheropticalcomponents.Duetothede— situ.Thediameterofthebeam attheofCUSiSabout10
velopmentandapplicationtrendofshorterpulsewidth, m estimatedfrom thediffractionlimitfobiectivelens
shorterwavelengthand higherenergy lasertechnology, numericalaperture(NA)=0.1).Intheexperiment,the
silicaglas
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