MOCVD加热系统的研究.pdfVIP

摘 要 金属有机物化学气相沉积(MOCVD, Metal Organic Chemical Vapor Deposition) 是业 界生产半导体光电器件和微波器件的关键设备。加热系统是MOCVD系统的重要组成部 分。每个新颖的反应室设计，都需要与之相匹配的加热装置和控制技术。本文分析了现 有MOCVD设备的加热系统，对红外辐射加热和高频感应加热进行了对比分析，探讨了 各自的加热特点。 本文从基础理论到实际应用，对红外辐射加热器和高频感应加热器的应用、选材等 进行了讨论。采用数值模拟的方法对红外辐射加热器和高频感应加热器进行了结构优化 设计，并研究了其安装精度要求。结果表明： 对红外辐射加热器 1）对丝状红外辐射加热器而言，电阻丝布置的均匀性决定了石墨基座表面温度分布的 均匀性；有必要使石墨基座旋转起来，这样可使丝状加热均匀性提高20% ； 2 ）对片状红外辐射加热器而言，电阻片的形状与石墨基座表面温度均匀性密切相关； 片状加热器安装要求低于丝状加热器； 3 ）红外辐射加热器与石墨基座的高平行度对石墨基座表面的温度均匀性影响很大。 对高频感应加热器 1）通电导线的空间布置，特别是外圈导线的布置决定了加热均匀性； 2 ）加热均匀性很好，石墨基座表面温度偏差只有0.3℃； 3 ）高频感应加热器的安装要求比红外辐射加热器高，加热器与基座之间必须保持高平 行度。 为保证设备安全可靠运行，必须把高温区域与外界隔绝起来。基于CFD技术，本文 对MOCVD设备中几处需冷却的地方进行模拟设计，确定了几何结构。 关键词：MOCVD; 红外辐射加热; 高频感应加热; 冷却 I Abstract Metal organic chemical vapor deposition (MOCVD) is a key equipment in the manufacturing of semiconductor optoelectronic devices and microwave devices in industry. Heating system is a vital part of MOCVD. Specific heating device and thermal control technology is needed for each new reactor design. In this dissertation, the heating systems of existing MOCVD equipment were analyzed. The comparison between infrared radiation heating and high frequency induction heating was conducted, and their heating characteristics were investigated. The application and material of infrared radiation heater and high frequency induction heater were discussed from theory to practical application in this article. The structure of these two heaters was numerically designed and optimized. And the installation of them was also numerically analyzed. The results are as follows, For infrared radiation heater, 1) For filament infrared radiation heater, te