金刚石薄膜低温合成研析.pdfVIP

Abstract Abstract The ofdiamond filmsandthe synthesisprocess theoreticalmodelhave been studiedinthis Plasma paper．GlowAssistedHotFilament Chemical are in is VaporDeposistion adoptedexperiments．The perpose toreduce substrate inordertorealizelow temperature of diamondfilmsandestablish synthesis high quality primary theoretical modeloflow temperaturesynthesis includes GPCVD The Experimentalsystem typical apparatus and structuralcharacteristicsoffilm aredetected component samples andanalysedby electron usingsanning (SEM) microscopy micro-Raman and substract Spectroscopy X·ray silicon．and aremixtureof is(1oo)singlecrystal operatinggases and inall CH4 H2 experiments ofdiamondfilmsarestudied in Synthesisprocess diamondfilmsare at experiments．Finallyhighquality deposited substrate setof temperature(330。C一350。C】．Agrowth shouldbe