Analysis and Simulation of Functional Stress Degradation on VDOMS Power Transistors英文文献资料.docVIP
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Analysis and Simulation of Functional Stress Degradation on VDOMS Power Transistors英文文献资料
ActiveandPassiveElec.Comp.,2002,Vol.25,pp.215–223
ANALYSIS AND SIMULATION OF FUNCTIONAL
STRESS DEGRADATION ON VDMOS POWER
TRANSISTORS
M.ZOAETERa,*,B.BEYDOUNa,M.HAJJARa,M.DEBSaandJ-PCHARLESb
aLaboratoiredePhysiquedesMate′riaux, FacultyofScience-I,LebaneseUniversity,
P.O.Box13-5789,Beirut1102-2070,Lebanon; bMate′riaux Optiques,Photonique
etSyste`mes (MOPS),CLOES,Supelec,2,rueEdouardBelin,57070Metz,France
(Received5September2001;In?nalform6November2001)
TheuseofVDMOStransistorundercertainfunctionalstressconditionsproducesamodi?cationofitsphysicaland
electrical properties. This paper explores the physical analysis and SPICE simulation of the degradation effects
relatedtothecomponentmicronicstructure,andpointsoutthedegradedparametersfollowingthisstress.
INTRODUCTION
TheuseofVDMOStransistorinthe?eldofpowerelectronicshasincreasedwidelyduetoits
highinputimpedance,easeof isolated-gridcontrolandnegativetemperaturecoef?cientof
thedraincurrentthatpreventsthermalracing.
TheuseofpowerVDMOSundercertainstressconditionsmayleadtoamodi?cationofits
physical and electrical properties. There are many types of stress: stress by irradiation for
whichthecomponentoperationisalteredfollowingtheactionoftheradiationonthematerial
[1–4];thermalstresswherethetemperatureeffectisadominantfactorindegradation;and
electrical stress which can arise from the application of a power surge or intense current
peaks on the component grid. In an industrial circuit, the coercive use of the component
satisfying a functional need often produces degradations of complicated origins. Degrada-
tionscorrespondingtoafunctionalstressinaninvertercircuitarethesubjectofthiscommu-
nication.Thestudyexplorestheanalysisandthesimulationofthedegradationseffectrelated
tothecomponentmicronicstructureandpointsoutthesensitiveparameters.Thealterationof
theseparametersmodi?estheVDMOSoperationandtheirvaluechangesgiveameasureof
theirelectricalpropertiesdegradationdegreeandidenti?esthedegradationmechanisms.
STRESSSTUDYINVDMOS
Th
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