Characteristics and Photocatalytic Properties of Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation英文文献资料.docVIP

  • 1
  • 0
  • 约2.4万字
  • 约 8页
  • 2017-05-10 发布于上海
  • 举报

Characteristics and Photocatalytic Properties of Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation英文文献资料.doc

CharacteristicsandPhotocatalyticPropertiesofThinFilmPreparedbySputterDepositionandPost-NIonImplantation英文文献资料

HindawiPublishingCorporation AdvancesinMaterialsScienceandEngineering Volume2012,ArticleID923769,7pages doi:10.1155/2012/923769 ResearchArticle CharacteristicsandPhotocatalyticPropertiesofTiO2ThinFilm PreparedbySputterDepositionandPost-N+IonImplantation HaiderA.Shukur, MitsunobuSato, IsaoNakamura, andIchiroTakano 1 2 3 1 1 DepartmentofElectricalEngineering,FacultyofEngineering,KogakuinUniversity,2665-1,Nakano-machi, Hachioji-shi,Tokyo192-0015,Japan 2 3 DivisionofBasicLiberalArts,KogakuinUniversity,2665-1,Nakano-machi,Hachioji-shi,Tokyo192-

您可能关注的文档

文档评论(0)

1亿VIP精品文档

相关文档