射频磁控溅射制备TiO2光催化薄膜的表征.pdfVIP

Vo 1.33 ,NO.7 稀街金属材料与工程 第 33 卷第7 期 RARE METAL MATE民IALSANDENG刑EERING July 2004 2∞4 年 7 月 Characterization of Ti02 Photocatalytic Thin Films Prepared by Radiofrequency Sputtering Zheng Sh此时， Hao Weichang , Pan Fe吨， Zhang Junyeng , Wang Tianmin (Beijing University ofAeronautics and Astronautics , Beijing 100083, China) Abstract: Ti02 thin fiJ ms were prepared on microscope glass slides by radiof记quency magnetron sputtering method under different flow ratios of Ar and O2gases. The films were characterized by X-ray diffraction (XRD), atomic force microscope (AFM) , Raman spectroscopy and UV.VIS spectrophotometer.γhe results indicated that the film prepared under the f1 0w ratio ofAr:02=20 sccm:5 sccm has a higher photocata1ytic activity. Key words:γi02 thin film; f1 0w ratio; surface roughness; photocatalytic activity CLC number: TG 146.4 Document code: A Article ID: 1002-185X(2004)07-0752心3 1 Introduction ratios ofAr and O2 gases were obtained. The c叩stalline phase and microstructure of the Tì02 Titanium dioxide (Ti0 ) has been extensively 2 thin films were measured using a Dmaxl2200 automatic studied as a photocatalyst for deoxidation of metal ions X咽y diffractometer (XRD) with a Cu Kαso旧ce under an or oxidation of