effects of additional oxygen flow on the optical and electrical properties of ion beam sputtering deposited molybdenum-doped zinc oxide layer效果额外的氧气流的光学和电学性质离子束溅射沉积molybdenum-doped氧化锌层.pdfVIP

Hindawi Publishing Corporation Journal of Nanomaterials Volume 2012, Article ID 562701, 8 pages doi:10.1155/2012/562701 Research Article Effects of Additional Oxygen Flow on the Optical and Electrical Properties of Ion Beam Sputtering Deposited Molybdenum-Doped Zinc Oxide Layer Chin-Chiuan Kuo,1 Chi-Chang Liu,1 Shao-Chih He,2 Jing-Tang Chang,3 and Ju-Liang He2 1 Department of Mechanical Engineering, Chien Kuo Technology University, Changhua City 500, Taiwan 2 Department of Materials Science and Engineering, Feng Chia University, Taichung City 40724, Taiwan 3 Graduate Institute of Biomedical Materials and Tissue Engineering, College of Oral Medicine, Taipei Medical University, Taipei City 110, Taiwan Correspondence should be addressed to Chin-Chiuan Kuo, cckuo@.tw Received 20 March 2012; Revised 4 May 2012; Accepted 6 May 2012 Academic Editor: Ping Xiao Copyright © 2012 Chin-Chiuan Kuo et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. The transparent conductive molybdenum-doped zinc oxide (MZO) was deposited onto a flexible polyethersulfone (PES) substrate by using an ion beam sputtering system. An argon ion beam was used to sputter an MZO target at constant pressure of 0.67 Pa and substrate temperature of 130◦C with varying the oxygen flow rate from 0 to 12 sccm. The influences of additional oxygen flow on the microstructure, optical, and electrical properties of films were investigated. The obtained MZO films present a crystalline structure. With increasing the oxygen flow rate, their electrical resistivity increases, and the optical band gap decreases from 3.46 to 3.20 eV. The film deposited i