Applications of ICP Etching In Fabrication of Controllable Polymer Nanowires-材料合成化学课件PPT.ppt

Applications of ICP Etching In Fabrication of Controllable Polymer Nanowires-材料合成化学课件PPT.ppt

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Applications of ICP Etching In Fabrication of Controllable Polymer Nanowires-材料合成化学课件PPT

Applications of ICP Etching In Fabrication of Controllable Polymer Nanowires Zhong Lin Wang Nanowires : Sizes, interfacial properties and electronic properties can be precisely controlled during synthesis Possible to combine different chemical composition in nanoscale Structures of NWs can be designed to achieve new functions Polymer nanowires (PNWs) Potential applications in organic light-emitting diodes (OLEDs), field-effect transistors (FETs) and solar cells Orientation, dimensionality and location control required (Challenge!!) Previous approach: Anodic aluminum oxide (AAO) template-based technique Distorted and bunched PNWs after removing the template Our approach: Inductively coupled plasma (ICP) etching Plasma Highly ionized gas High chemical reactivity Methods to generate plasma See more information about plasma: /translate?hl=zh-CNsl=entl=zh- CNu=http%3A%2F%2F%2Fwiki%2FPlasma_(physics)anno=2 Lower pressure discharges Glow discharge plasmas Capacitively coupled plasma (CCP) Inductively coupled plasma (ICP) Wave heated plasma Atmospheric pressure Arc discharge Corona discharge Plasma etching Key process in large-scale integrated circuit manufacture Physical and chemical etching process isotropic etching Improvement (ICP) Inductive coils are used to create an intense plasma(1015 cm-3)with higher energy Connect the sample to the RF signal to get a more anisotropic etching Top electrode Bottom electrode Earlier edition Processing parameters Pressure: 10mTorr(1.3Pa) Etchants: Ar, O2, CF4 Ar: physical etching O2(O ·): primary etchant CF4: increase O concentration Flow rates: 10-40 sccm Power sources: 400W to generate dense plasma 100W(600V) to accelerate plasma He: keep the substrate cool(60 ℃) Substrate Spin-coat polymer film Pattern design (microtip writing) ICP etching All NWs perpendicular to the substrate Uniform size and distribution Not limited by the chemical structures, worked for any organic materials interested Products show Pattern fabr

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