利用原子力显微镜的刻线高度测量模型与算法分析-model and algorithm analysis of engraving height measurement by atomic force microscope.docxVIP

AbstractMeasurement of step height has become increasingly important in Nanometrology, which is the field of dimensional metrology in the nano-scale, for vertical calibration of scanning probe microscopes SPMs, such as atomic force microscopes AFMs; step height standards and for the determination of semiconductor surface features. Step height is defined as the perpendicular distance between two plane-parallel planes comprising the substrate and the elevation or indentation. As a result of continuous decrease in device dimensions, industries (apart from the semiconductor industry) such as microelectronics integrated circuits (IC), data storage, thin films, micro-fabrication and engineering, flat panel displays and micro-/nano-electromechanical systems (MEMS/NEMS) have faced serious challenges in determining step height and other feature dimensions such as critical dimension CD, sidewall angles SWA, and line-edge roughness LER.Equipment makers and software vendors have developed a number of algorithms for measurement of step height but one major problem of this is that step height values from different laboratories and research centres cannot often be compared owing to the methods divergence that characterize the different algorithm available in the market. In addition, software vendors often see their algorithm as a “black box” for patent reasons thereby making it difficult in comparing step height values derived from these. This results in reproducibility issues thereby slowing down the transition of a product from concept to the market.In this research work, an efficient model and algorithm for the measurement of step height using an Atomic Force Microscope is presented. Prior to taking any step height measurement of a semiconductor device, issues involved in the vertical calibration of the equipment (AFM in this case) and the step height standards have to be addressed. This will ensure an error-free step height measurement results to be obtained. Vertical ca