多弧离子镀制备TiC薄膜的工艺及性能研究-材料学专业论文.docxVIP

武汉科技大学 硕士学位论文 第 I页 摘要 自 70 年代以来，表面技术得到突飞猛进的发展，无论在学术上还是在实际应用中都 取得了丰硕的成果.离子镀技术是当今使用丽最广、最先进的表面处理技术之一，而多弧 离子镀更是其中的佼佼者，本文采用多弧离子镀技术在高速钢表面沉积1i C 薄膜并对膜的 制备工艺和性能进行了系统的研究。 论文第一部分主要研究镀膜过程中，沉积工艺参数如 C2日2 流量、1i靶电流、负偏压和 沉积温度等对薄膜显微硬度和膜/基结合力的影响，从而得出多弧离子镀技术制备1i C 膜的 最使工艺为: C2H2 流最 0.20Umin、沉积混度300C 、氯气流最0.02Umin 、1i靶电流60A、 沉积时间 ωmin、负偏压250V. 在此工艺下制备的1iC 薄膜显微硬度达到 2900HVo.os ，膜 /基结合力达到 50N. 膜原约 5 微米。 论文第二部分主要研究了1i C 薄膜的耐磨性并对其内应力进行了测定.微量磨损试验 表明: 1iC 薄膜具有比1iN 膜 小的摩擦系数， 优异的耐磨性.应力测试结果表明: 1iC 薄膜的宏观总应力、热应力和本征应力均为 ?E技力，底威力的存在使得材料比自由状态下 的材料具有更强的抗破坏能力. 关键词z 多弧离子镀; 1iC 薄膜:耐磨性:内应力 第 II 页 武汉科技大学硕士学位论文 Abstract Since the 70s，出esurf部e engineering has been progressed rapidly，which has not only obtained substantial achievement in academic but also in the practical applications. Ion plating technique is one of the most advanced and widely used surface 仕eatment techniques at present. The Multi-arc ion plating technique 扭曲.e most outstanding one.ηús study prepared 1?C thin films on 由e high speed steel by multi-arc íon plating technique and has conducted a system research on the preparation and properties. The fIISt part of 也is pap町 has mainly studied the effect of facωrs on the micro-hardness and the adhesion strength， such as C2H2 flow rate，target power，bias voltage，deposition tempera阳re and so on.The best pararnet衍s have obtained. Conc1usions : C 2 flow rate is 0.20Llmin; deposition temperature is 300.C; Ar flow rate is 0.02L1n由;但rget power ch∞seas 60A;d叩osition time is 60min and bias voltage is 250V. When the TiC coatings prep缸ed under these p缸ame阳百 its micro-hardness achieves 2900HVo.os ，the adhesion strength is 50N and the depth is about 5μrn. 刀le second p翩。f 由is pa归r has mainly studied the we缸 resl抵ance of TiC coatings and de能rmined its intemal stress. The wear resistance test indicated tha1， the 卫C thin films have smaller 企iction coefficient and more outstanding we缸 resi民缸lce 也an the TiN coatings. The 掬ess test resuIts indicated 也a1， the total