磁控溅射电源控制系统的研究与设计-电力电子与电力传动专业论文.docxVIP

Abstract Title: RESEARCH AND DESIGH ON CONTROL SYSTEM FOR MAGNETRON SUPTTERING POWER SUPPLY Major: Power Electronics and Power Drives Name: 60 NING Supervisor: Prof. Qiang SUN Abstract As a kind of coating crafts，magnetron sputtering technique is widely used in energy， materials ，substances，environment and many other professional field because of its superior advantages. Since the magne仕on sputtering power supply used in these areas has problems- bad constant current characteristic and easy to arc，which likely to cause defects in the films，affect the films with uniformity and even damage power supply that has been unable to meet the high demands of the coating process. Aiming at these problems ，according to the characteristics and the equivalent circuit model of plasma load，this article introduced and analyzed the working principle of the main circuit topology based on a bipolar pulse conversion topology，and then focused on the control method of the power supply and the arc detection and suppression，which were the key technologies. To meet the demands of the sputtering process ，this paper introduced the double-loop composite control strategy based on the feed-forward compensation of reference cuηent and designed the control parameters by pole assignment. For different types of 缸c，this paper designed the protection and suppression strategies，a combination of triple detections and two levels protection. With the high-performance DSP as the control core，the whole control system with software and hardware of the magnetron sputtering power supply was designed at last. Simultaneously，simulation of the plasma load and the entire closed-loop system has been given in Matlab/Simulink. At last，on the basis of theoretical analysis and simulation，a 6kW pulse magnetron spu忧ering prototype is carried out. Experimental results verify the correctness and fea